Introduction: Secondary Ion Mass Spectrometry (SIMS) is an analytical technique used to image (2D and 3D) the chemical composition of solid surfaces. The techique ultilizes ion beams to physically bombard the surface of materials. The impact of the primary ions causes the ejection of secondary ions, neutral particles, and electrons from the surface of the material. The secondary ions are extracted into a mass analyzer, where they are separated by there mass-to-charge ratio. The resulting mass spectrum provides elemental, molecular, and isotopic information of the material. Ion images, where a mass spectra is obtained at every pixel, reveal the distribution of the surface chemicals. Depth profiling and 3D ion images are aquired by sequentially sputtering away analyzed material and collecting information as a function of depth.